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Semiconductor Cleaning Machine
Created with Pixso. Fully Automatic Ultrasonic Cleaning Machine Silicon Wafers Ultrasonic Cleaner Equipment 100KW

Fully Automatic Ultrasonic Cleaning Machine Silicon Wafers Ultrasonic Cleaner Equipment 100KW

Brand Name: Jietai
Model Number: JTM-10720AD
MOQ: 1
Price: One million
Delivery Time: 30-60work days
Payment Terms: T/T
Detail Information
Place of Origin:
Dongguan, Guangdong
Certification:
CE, FCC, ROHS, etc.
Name:
Ultrasonic Cleaning Machine
Model:
JTM-10720AD
Type:
Fully Automatic Ultrasonic Cleaning Machine
Cleaning Frequency:
40KHZ
Cleaning Temperature:
Ambient Temperature - 100℃
Number Of Tanks:
10
Overall Dimensions:
12M×2M×2.6M
Power:
100KW
Packaging Details:
Packaging: Wooden case, wooden frame, stretch film. Dimensions: 12M*2M*2.6M
Supply Ability:
One unit. It will take 30 to 60 days.
Highlight:

Fully Automatic Ultrasonic Cleaning Machine

,

Silicon Wafers Ultrasonic Cleaner Equipment

,

Ultrasonic Cleaner Equipment 100KW

Product Description

Fully Automatic Ultrasonic Cleaning Machine For Semiconductor Silicon Wafers

 

 

Full-process Traceability, Cleanliness Meeting IATF 16949 Standard

 

  1. Closed-loop Online Inspection to Prevent Defective Products from Leaving the Line

 

  • Machine Vision Sampling Inspection: One piece is automatically selected for inspection out of every 100 pieces. The surface of the frame is scanned by a 2-megapixel industrial camera, and an AI algorithm is used to identify particle residues ≥5μm (false negative rate < 0.01%).
  • Salt Spray Test Integration: The cleaned frames can be directly connected to the subsequent salt spray testing machine. The actual test shows that the salt spray resistance time of the electroplated layer is increased by 20% (extended from 48 hours to 57.6 hours).

 

  1. Anti-static Design to Protect Precision Surface Treatment

 

  • Full Coverage of Ionizing Air Bars: Eight sets of anti-static ionizing air bars (ionization voltage ±5kV) are installed in the drying section and at the discharge port to neutralize the static electricity on the frame surface in real-time (residual voltage < 100V), preventing the adsorption of dust particles in the air.
  • Cleanroom-level Protection: The entire equipment is equipped with a negative pressure hood with a cleanliness level of Class 10,000 (a Class 100 laminar flow hood is optional), ensuring that the cleaning process is free from external contamination and meeting the ultra-clean cleaning requirements before optical coating.

 

  1. Safety Protection System to Create an Accident-free Workshop

 

  • Triple Interlock Protection: When the door is opened, the ultrasonic power supply is automatically cut off, the spray pump stops, and the drying heating tube is powered off, with a response time < 0.2 seconds.
  • Leakage Monitoring System: A liquid level sensor and a conductivity probe are integrated at the bottom of the tank. When a cleaning liquid leak is detected, the weir drainage pump is activated within 3 seconds, accompanied by audible and visual alarms.
  • 7×24 Hour Response: Five major service centers nationwide (Pearl River Delta / Yangtze River Delta / Beijing-Tianjin-Hebei / Chengdu-Chongqing / Wuhan) stock a full range of vulnerable parts (transducers, spray nozzles, heating tubes) and can arrive on-site within 4 hours.
  1. Fully Automatic Ultrasonic Cleaning Machine Silicon Wafers Ultrasonic Cleaner Equipment 100KW 0

    Fully Automatic Ultrasonic Cleaning Machine Silicon Wafers Ultrasonic Cleaner Equipment 100KW 1

    Fully Automatic Ultrasonic Cleaning Machine Silicon Wafers Ultrasonic Cleaner Equipment 100KW 2

    Fully Automatic Ultrasonic Cleaning Machine Silicon Wafers Ultrasonic Cleaner Equipment 100KW 3

    Fully Automatic Ultrasonic Cleaning Machine Silicon Wafers Ultrasonic Cleaner Equipment 100KW 4

Good price online

Products Details

Created with Pixso. Home Created with Pixso. Products Created with Pixso.
Semiconductor Cleaning Machine
Created with Pixso. Fully Automatic Ultrasonic Cleaning Machine Silicon Wafers Ultrasonic Cleaner Equipment 100KW

Fully Automatic Ultrasonic Cleaning Machine Silicon Wafers Ultrasonic Cleaner Equipment 100KW

Brand Name: Jietai
Model Number: JTM-10720AD
MOQ: 1
Price: One million
Packaging Details: Packaging: Wooden case, wooden frame, stretch film. Dimensions: 12M*2M*2.6M
Payment Terms: T/T
Detail Information
Place of Origin:
Dongguan, Guangdong
Brand Name:
Jietai
Certification:
CE, FCC, ROHS, etc.
Model Number:
JTM-10720AD
Name:
Ultrasonic Cleaning Machine
Model:
JTM-10720AD
Type:
Fully Automatic Ultrasonic Cleaning Machine
Cleaning Frequency:
40KHZ
Cleaning Temperature:
Ambient Temperature - 100℃
Number Of Tanks:
10
Overall Dimensions:
12M×2M×2.6M
Power:
100KW
Minimum Order Quantity:
1
Price:
One million
Packaging Details:
Packaging: Wooden case, wooden frame, stretch film. Dimensions: 12M*2M*2.6M
Delivery Time:
30-60work days
Payment Terms:
T/T
Supply Ability:
One unit. It will take 30 to 60 days.
Highlight:

Fully Automatic Ultrasonic Cleaning Machine

,

Silicon Wafers Ultrasonic Cleaner Equipment

,

Ultrasonic Cleaner Equipment 100KW

Product Description

Fully Automatic Ultrasonic Cleaning Machine For Semiconductor Silicon Wafers

 

 

Full-process Traceability, Cleanliness Meeting IATF 16949 Standard

 

  1. Closed-loop Online Inspection to Prevent Defective Products from Leaving the Line

 

  • Machine Vision Sampling Inspection: One piece is automatically selected for inspection out of every 100 pieces. The surface of the frame is scanned by a 2-megapixel industrial camera, and an AI algorithm is used to identify particle residues ≥5μm (false negative rate < 0.01%).
  • Salt Spray Test Integration: The cleaned frames can be directly connected to the subsequent salt spray testing machine. The actual test shows that the salt spray resistance time of the electroplated layer is increased by 20% (extended from 48 hours to 57.6 hours).

 

  1. Anti-static Design to Protect Precision Surface Treatment

 

  • Full Coverage of Ionizing Air Bars: Eight sets of anti-static ionizing air bars (ionization voltage ±5kV) are installed in the drying section and at the discharge port to neutralize the static electricity on the frame surface in real-time (residual voltage < 100V), preventing the adsorption of dust particles in the air.
  • Cleanroom-level Protection: The entire equipment is equipped with a negative pressure hood with a cleanliness level of Class 10,000 (a Class 100 laminar flow hood is optional), ensuring that the cleaning process is free from external contamination and meeting the ultra-clean cleaning requirements before optical coating.

 

  1. Safety Protection System to Create an Accident-free Workshop

 

  • Triple Interlock Protection: When the door is opened, the ultrasonic power supply is automatically cut off, the spray pump stops, and the drying heating tube is powered off, with a response time < 0.2 seconds.
  • Leakage Monitoring System: A liquid level sensor and a conductivity probe are integrated at the bottom of the tank. When a cleaning liquid leak is detected, the weir drainage pump is activated within 3 seconds, accompanied by audible and visual alarms.
  • 7×24 Hour Response: Five major service centers nationwide (Pearl River Delta / Yangtze River Delta / Beijing-Tianjin-Hebei / Chengdu-Chongqing / Wuhan) stock a full range of vulnerable parts (transducers, spray nozzles, heating tubes) and can arrive on-site within 4 hours.
  1. Fully Automatic Ultrasonic Cleaning Machine Silicon Wafers Ultrasonic Cleaner Equipment 100KW 0

    Fully Automatic Ultrasonic Cleaning Machine Silicon Wafers Ultrasonic Cleaner Equipment 100KW 1

    Fully Automatic Ultrasonic Cleaning Machine Silicon Wafers Ultrasonic Cleaner Equipment 100KW 2

    Fully Automatic Ultrasonic Cleaning Machine Silicon Wafers Ultrasonic Cleaner Equipment 100KW 3

    Fully Automatic Ultrasonic Cleaning Machine Silicon Wafers Ultrasonic Cleaner Equipment 100KW 4