Pre-treatment Module: Equipped with multi-media filtration and activated carbon adsorption to remove suspended solids, chlorine, and organic impurities (TOC ≤ 5ppm), preventing membrane fouling and ensuring long-term stability of downstream components.​

Double-Stage RO System: The first RO stage achieves 95%+ salt rejection, while the second stage further purifies permeate to reduce residual ions (conductivity ≤ 5μS/cm), laying the foundation for high-purity water production.​

EDI Module: Utilizes continuous electrodeionization without chemical regeneration to achieve ultrapure water output with resistivity up to 18.2 MΩ·cm (25℃) and particle count (≥0.1μm) ≤ 10 particles/ml—meeting the strict water quality standards for precision ultrasonic cleaning (e.g., semiconductor wafers, medical instruments, and optical components).​

Single/Multi-tank Ultrasonic Cleaners: Delivers low-TOC, low-particle ultrapure water to enhance cavitation effect—ensuring contaminants (e.g., flux residues, metal fines) are thoroughly dislodged without re-depositing on component surfaces.​

Semi-Automatic/Fully Automatic Ultrasonic Lines: Integrates with PLC control systems to synchronize water supply with cleaning cycles (e.g., rinsing stages), reducing manual intervention and improving production efficiency.​

Custom Ultrasonic Setups: Adaptable to high-frequency (80-120kHz) precision cleaning or low-frequency (28-40kHz) heavy-duty degreasing applications, as the ultrapure water’s low conductivity minimizes electrochemical corrosion risks for sensitive parts.