1 Ton Two-Stage Reverse Osmosis EDI Ultrapure Water Machine (DI EDI)
—— High-precision cleaning water solutions
Product positioning
The high-purity water treatment equipment specially designed for the ultrasonic cleaning industry integrates the core technology of two-stage reverse osmosis (RO) continuous electrodesalination (EDI) to achieve 1 ton/hour ultrapure water output, and the water quality meets the electronic grade standard (resistivity ≥ 18.2MΩ・cm, TOC≤5ppb, particle size ≤0.1μm). It is suitable for high-precision scenarios such as semiconductor wafer cleaning, medical appliance disinfection, and optical lens coating, solves the problems of traditional single-stage filtration water fluctuation and cumbersome chemical regeneration, provides stable and reliable ultrapure water guarantee for ultrasonic cleaning, and significantly improves the cleaning yield (such as reducing the defective rate of semiconductor wafer particles by 70%).

Core technical advantages
1. Two-stage reverse osmosis (RO) pretreatment system
1. Three-stage progressive filtration
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Processing phase
Core components
Technical parameters
Purifying effect
pretreatment
5μm PP filter cartridge activated carbon softening resin
Filtration accuracy ≤5μm, residual chlorine removal rate > 99%
Removes sediment, organic matter, calcium and magnesium ions and protects the RO membrane
Level 1 RO
Dow BW30-400 membrane element
Salt removal rate ≥ 99.5% and recovery rate 60%
Removes more than 99% of ionic and small molecule contaminants
Secondary RO
Japan Toray TM720D membrane element
The salt rejection rate ≥ 99.9%, and the resistivity ≥ 10 MΩ・cm
Deep removal of primary RO residual ions provides a high-quality water source for EDI
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2. Intelligent anti-fouling technology
Pulsed automatic flushing:
▶ Automatic flushing of the membrane surface during shutdown (30 seconds) and low pressure flushing mode (pressure ≤ 0.3MPa) extend the membrane element life to 3 years (2 years for conventional equipment)
▶ The conductivity sensor monitors the quality of the RO permeate in real time, and automatically initiates chemical cleaning when the standard is exceeded (citric acid/sodium bisulfite, frequency ≤ 2 times/year)
Energy-efficient design:
✔ Inverter pump set (power adjustment range 30%-100%), energy consumption per ton of water ≤ 0.8kWh (conventional equipment ≥ 1.2kWh)
✔ Brine recovery system: Secondary RO brine is returned to the front end of primary RO, and the water utilization rate is increased to 75% (far exceeding the industry standard of 50%)
2. EDI ultrapure water system (continuous electrodesalination technology)
1. Deep desalination without chemical regeneration
Electrically driven ion migration:
▶ 0.6-1.2A constant current drive for deep ion removal (Na⁺/K⁺ residue<1ppb, Cl⁻<0.5ppb)
▶ The resistivity is stabilized at 18.2 MΩ・cm (25°C) in real time, which meets the requirements of the SEMI E1.1 standard for semiconductor cleaning water
Long-term resin management:
✔ IONPURE IX-30 FILM STACK IN THE UNITED STATES WITH 20% MORE RESIN FILLING AND ≥ 5 YEARS SERVICE LIFE (3 YEARS FOR CONVENTIONAL EDI STACKS)
✔ Automatic current compensation algorithm: dynamically adjust the voltage according to the resistivity of the inlet water (accuracy ±1V) to ensure that the permeate water quality fluctuates by <1%
2. Zero-emission eco-friendly design
Brine Recycling:
▶ Concentrated water (resistivity≥50 kΩ・cm) can be used as rinse water for ultrasonic cleaners, reducing wastewater discharge by 60%
▶ Equipped with a pH adjustment device (accuracy ±0.1), the pH of the concentrated water is controlled at 6-8, and it is directly connected to the reclaimed water system in the plant
Acid-base regeneration:
✔ Abandon the traditional mixed-bed chemical regeneration, avoid the risk of hydrochloric acid/caustic soda storage, and comply with GB 31573-2015 "Emission Standard for Pollutants in Inorganic Chemical Industry"