products details

Home Products

Semiconductor Silicon Wafer Cleaner - Ultrasonic Alkaline/Acid Cleaning + DI Water Rinsing, 40KHz-80KHz, 60℃

Name: Semiconductor Silicon Wafer Cleaner - Ultrasonic Alkaline/Acid Cleaning + DI Water Rinsing, 40KHz-80KHz, 60℃
Brand: guangdong Jietai Ultrasonic cleaning Equipment Co., Ltd.
SKU: JTM-100504AD
Price: 800000 USD
Availability: InStock

Brand Name:	Jietai
Model Number:	JTM-100504AD
MOQ:	1
Price:	￥800000
Delivery Time:	30-60work days
Payment Terms:	T/T

Detail Information

Product Description

Detail Information

Place of Origin:

Dongguan, Guangdong

Certification:

CE, FCC, ROHS, etc.

Model:

JTM-100504AD

Power:

120KW

Type:

Ultrasonic Alkaline Washing+Ultrasonic Acid Washing+Pure Water Rinsing

Cleaning Frequency:

40KHZ/80KHZ

Number Of Tanks:

Cleaning Temperature:

60℃

Overall Dimensions:

12M*2M*2.8M

Name:

Semiconductor Cleaning Machine

Packaging Details:

Packaging: Wooden case, wooden frame, stretch film. Dimensions: 12M*2M*2.8M

Supply Ability:

One unit. It will take 30 to 60 days.

Product Description

Product Introduction: Semiconductor Silicon Wafer Cleaner

Engineered specifically for semiconductor manufacturing, this precision cleaning system integrates multi-stage ultrasonic processes to meet the stringent surface purity requirements of silicon wafers, ensuring minimal particle contamination and residual removal critical for wafer fabrication.

Core Cleaning Processes:

Ultrasonic Alkaline Cleaning: Utilizes alkaline chemistry combined with ultrasonic energy to effectively remove organic contaminants, photoresist residues, and large particulate matter from wafer surfaces, preparing substrates for subsequent processing.
Ultrasonic Acid Cleaning: Targets inorganic impurities (e.g., metal ions, oxides) through acid-based ultrasonic treatment, leveraging cavitation effects to dislodge submicron contaminants embedded in wafer textures or patterned structures.
DI Water Rinsing: Final stage employs high-purity deionized water for thorough rinsing, eliminating residual cleaning agents and ensuring surface neutrality, a prerequisite for post-cleaning wafer handling and processing.

Technical Specifications:

Ultrasonic Frequency: 40KHz-80KHz (multi-frequency adjustable, optimizing cavitation intensity for different contamination types)
Operating Temperature: 60℃ (precision-controlled thermal environment to enhance chemical reactivity and cleaning efficiency)
Material Compatibility: Constructed with PVDF, quartz, and 316L stainless steel components to resist corrosive chemistries and prevent secondary contamination.

Key Advantages:

Achieves sub-10nm particle removal efficiency, compliant with SEMI standards for advanced wafer processing
Multi-frequency ultrasonic configuration adapts to diverse cleaning requirements (from bare wafer to patterned wafer stages)
Closed-loop temperature control ensures process repeatability, critical for batch-to-batch consistency
Integrates seamlessly into semiconductor front-end and back-end manufacturing lines

Application: Ideal for cleaning silicon wafers in IC manufacturing, MEMS fabrication, and semiconductor packaging processes, where surface integrity directly impacts device performance and yield.

Keywords: Semiconductor wafer cleaner, ultrasonic alkaline/acid cleaning, DI water rinsing, 40-80KHz, 60℃ temperature control, silicon wafer processing

Semiconductor Silicon Wafer Cleaner - Ultrasonic Alkaline/Acid Cleaning + DI Water Rinsing, 40KHz-80KHz, 60℃ 0

Semiconductor Silicon Wafer Cleaner - Ultrasonic Alkaline/Acid Cleaning + DI Water Rinsing, 40KHz-80KHz, 60℃ 2

Semiconductor Silicon Wafer Cleaner - Ultrasonic Alkaline/Acid Cleaning + DI Water Rinsing, 40KHz-80KHz, 60℃ 3

Semiconductor Silicon Wafer Cleaner - Ultrasonic Alkaline/Acid Cleaning + DI Water Rinsing, 40KHz-80KHz, 60℃ 4

Semiconductor Silicon Wafer Cleaner - Ultrasonic Alkaline/Acid Cleaning + DI Water Rinsing, 40KHz-80KHz, 60℃ 5

Tags:

Automated Ultrasonic Cleaner

Ultrasonic Cleaner Equipment

Ultrasonic Cleaning System

11 Tanks Semiconductor Cleaning Machine Silicon Wafer Cleaning Machine 40KHZ

Get Best Price

Video

100KW Automated Ultrasonic Cleaning System 11 Tanks Ultrasonic Cleaning Machines

Get Best Price

Video

High Efficiency Semiconductor Cleaning Machine 250KW Customized Ultrasonic Cleaner

Get Best Price

Video

Multi Stage Automated Ultrasonic Cleaning Machine Customized Passivation System

Get Best Price

Video

Manual Semiconductor Cleaning Machine 251KW Electrolytic Cleaning Line Customized For Valve Body

Get Best Price

Video

Semiconductor Wafers Ultrasonic Cleaning System 100KW Automated Ultrasonic Cleaner

Get Best Price

180KW Semiconductor Cleaning Machine Valve Bodies Passivation Systems 40KHZ - 80KHZ

Get Best Price

Video

Fully Automatic Ultrasonic Cleaning Machine Silicon Wafers Ultrasonic Cleaner Equipment 100KW

Get Best Price

Products Details

Home Products

Semiconductor Cleaning Machine

Semiconductor Silicon Wafer Cleaner - Ultrasonic Alkaline/Acid Cleaning + DI Water Rinsing, 40KHz-80KHz, 60℃

All Category

Ultrasonic Cleaning Equipment

Electronics Ultrasonic Cleaner

Instrument Ultrasonic Cleaner

Semiconductor Cleaning Machine

Commercial Ultrasonic Cleaner

Aerospace Ultrasonic Cleaner

Medical Ultrasonic Cleaner

Custom Ultrasonic Cleaner

Spray Cleaning Machine

Ultrasonic Mold Cleaning Machine

Automotive Ultrasonic Cleaner

Industrial Wastewater Treatment Equipment

Semiconductor Silicon Wafer Cleaner - Ultrasonic Alkaline/Acid Cleaning + DI Water Rinsing, 40KHz-80KHz, 60℃

Brand Name:	Jietai
Model Number:	JTM-100504AD
MOQ:	1
Price:	￥800000
Packaging Details:	Packaging: Wooden case, wooden frame, stretch film. Dimensions: 12M2M2.8M
Payment Terms:	T/T

Detail Information

Product Description

Detail Information

Place of Origin:

Dongguan, Guangdong

Brand Name:

Jietai

Certification:

CE, FCC, ROHS, etc.

Model Number:

JTM-100504AD

Model:

JTM-100504AD

Power:

120KW

Type:

Ultrasonic Alkaline Washing+Ultrasonic Acid Washing+Pure Water Rinsing

Cleaning Frequency:

40KHZ/80KHZ

Number Of Tanks:

Cleaning Temperature:

60℃

Overall Dimensions:

12M*2M*2.8M

Name:

Semiconductor Cleaning Machine

Minimum Order Quantity:

Price:

￥800000

Packaging Details:

Packaging: Wooden case, wooden frame, stretch film. Dimensions: 12M*2M*2.8M

Delivery Time:

30-60work days

Payment Terms:

T/T

Supply Ability:

One unit. It will take 30 to 60 days.

Product Description

Product Introduction: Semiconductor Silicon Wafer Cleaner

Core Cleaning Processes:

Ultrasonic Alkaline Cleaning: Utilizes alkaline chemistry combined with ultrasonic energy to effectively remove organic contaminants, photoresist residues, and large particulate matter from wafer surfaces, preparing substrates for subsequent processing.
Ultrasonic Acid Cleaning: Targets inorganic impurities (e.g., metal ions, oxides) through acid-based ultrasonic treatment, leveraging cavitation effects to dislodge submicron contaminants embedded in wafer textures or patterned structures.
DI Water Rinsing: Final stage employs high-purity deionized water for thorough rinsing, eliminating residual cleaning agents and ensuring surface neutrality, a prerequisite for post-cleaning wafer handling and processing.

Technical Specifications:

Ultrasonic Frequency: 40KHz-80KHz (multi-frequency adjustable, optimizing cavitation intensity for different contamination types)
Operating Temperature: 60℃ (precision-controlled thermal environment to enhance chemical reactivity and cleaning efficiency)
Material Compatibility: Constructed with PVDF, quartz, and 316L stainless steel components to resist corrosive chemistries and prevent secondary contamination.

Key Advantages:

Achieves sub-10nm particle removal efficiency, compliant with SEMI standards for advanced wafer processing
Multi-frequency ultrasonic configuration adapts to diverse cleaning requirements (from bare wafer to patterned wafer stages)
Closed-loop temperature control ensures process repeatability, critical for batch-to-batch consistency
Integrates seamlessly into semiconductor front-end and back-end manufacturing lines

Application: Ideal for cleaning silicon wafers in IC manufacturing, MEMS fabrication, and semiconductor packaging processes, where surface integrity directly impacts device performance and yield.

Keywords: Semiconductor wafer cleaner, ultrasonic alkaline/acid cleaning, DI water rinsing, 40-80KHz, 60℃ temperature control, silicon wafer processing

Semiconductor Silicon Wafer Cleaner - Ultrasonic Alkaline/Acid Cleaning + DI Water Rinsing, 40KHz-80KHz, 60℃ 0

Semiconductor Silicon Wafer Cleaner - Ultrasonic Alkaline/Acid Cleaning + DI Water Rinsing, 40KHz-80KHz, 60℃ 2

Semiconductor Silicon Wafer Cleaner - Ultrasonic Alkaline/Acid Cleaning + DI Water Rinsing, 40KHz-80KHz, 60℃ 3

Semiconductor Silicon Wafer Cleaner - Ultrasonic Alkaline/Acid Cleaning + DI Water Rinsing, 40KHz-80KHz, 60℃ 4

Semiconductor Silicon Wafer Cleaner - Ultrasonic Alkaline/Acid Cleaning + DI Water Rinsing, 40KHz-80KHz, 60℃ 5

Tags: