Custom System for Semiconductor & Precision Valve Body Cleaning

This integrated production line combines EP electrolytic polishing and dual-frequency ultrasonic cleaning in one unified system, specially customized for high-standard surface treatment of semiconductor-grade valve bodies and precision fluid components. It simultaneously removes surface oxides, burrs, residual oil and micro contaminants, achieving ultra-smooth, uniform passivated surfaces that meet semiconductor and high-precision industrial cleanliness standards.

Equipped with a corrosion-resistant 316L stainless steel electrolytic tank and adjustable pulse power supply (0-50V, 0-1000A), the system delivers precise control over current density and electrolytic time. It effectively eliminates surface oxide layers, micro burrs and tiny structural defects on valve bodies, forming a uniform, bright and protective passivation film.

Built-in micron-level circulating filtration continuously removes metal ions and suspended impurities from the electrolyte, stabilizing solution purity and ensuring consistent polishing quality across batch production.

The system supports automatic switching between 28kHz and 40kHz ultrasonic modes, realizing staged rough and precision cleaning for complex valve body structures:

• 7×24h Rapid Technical Response: With three major service centers covering the Yangtze River Delta, Pearl River Delta and Beijing-Tianjin-Hebei regions. Core vulnerable parts are in stock for fast replacement, and on-site support is available within 24 hours.
• Systematic On-site Training: We provide 3-day professional on-site training covering equipment principles, standard operation and fault troubleshooting. Operators will obtain qualification certification to achieve independent and proficient operation in a short time.

Tailor-made for semiconductor valve bodies and high-precision industrial components, this integrated electrolytic and ultrasonic cleaning line delivers stable, high-standard surface treatment results for advanced manufacturing scenarios.