Máquina de Limpeza de Pastilhas de Semicondutores 120KW Máquina de Lavagem Ultrassônica 40KHZ / 80KHZ

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July 22, 2025
Brief: Discover the advanced Semiconductor Wafer Cleaning Machine, featuring a 120KW ultrasound washing system with 40KHZ/80KHZ frequencies. This machine offers a three-tank gradient cleaning process, including ultrasonic alkaline and acidic cleaning, plus pure water rinsing for superior wafer cleanliness. Perfect for high-precision semiconductor manufacturing.
Related Product Features:
  • Three-tank gradient cleaning system: ultrasonic alkaline, acidic, and pure water rinsing for thorough wafer cleaning.
  • Ultrasonic alkaline cleaning tank with 80kHz/120kHz dual-frequency switching for efficient photoresist residue removal.
  • Ultrasonic acid cleaning tank with 150kHz high-frequency ultrasonication to minimize wafer surface damage.
  • Pure water megasonic rinsing tank with 850kHz MF ultrasound for residue-free cleanliness.
  • Built-in micron-sized PP cartridge and magnetic filter for particle contaminant capture.
  • Precision temperature control (±0.5℃) ensures optimal cleaning performance.
  • Patented rotating spray arm for edge-enhanced cleaning, eliminating blind spots.
  • Online TOC detector and particle counter for real-time water quality monitoring.
FAQ:
  • What types of contaminants can this machine remove?
    The machine efficiently removes photoresist residue, metal ions, and submicron particles, ensuring high-precision cleanliness for semiconductor wafers.
  • How does the three-tank gradient cleaning system work?
    The system sequentially uses ultrasonic alkaline cleaning for photoresist removal, ultrasonic acidic cleaning for metal ion removal, and pure water rinsing for final residue-free cleanliness.
  • What is the advantage of the patented rotating spray arm?
    The rotating spray arm ensures thorough cleaning of the wafer edges, addressing the 1mm cleaning blind spot often missed by conventional methods.